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Optical Lithography: Here is Why (SPIE Press Monograph Vol. PM190), by Burn J. Lin
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This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
Topics include:
- Exposure Systems
- Image Formation
- The Meter of Lithography
- Components in Optical Lithography
- Processing and Optimization
- Immersion Lithography
- Outlook for optical lithography
- Sales Rank: #518327 in Books
- Published on: 2010-02-23
- Original language: English
- Dimensions: 10.00" h x 7.00" w x 1.25" l, 2.60 pounds
- Binding: Hardcover
- 492 pages
About the Author
Burn Lin is editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 75 articles, and holder of 37 U.S. patents.
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